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VISTEC ELECTRON BEAM GMBH

Overview
  • Total Patents
    35
  • GoodIP Patent Rank
    191,015
About

VISTEC ELECTRON BEAM GMBH has a total of 35 patent applications. Its first patent ever was published in 1999. It filed its patents most often in EPO (European Patent Office), Germany and Japan. Its main competitors in its focus markets electrical machinery and energy, micro-structure and nano-technology and optics are WIELAND MARCO JAN-JACO, IMS NANOFABRICATION AG and LEICA MICROSYS LITHOGRAPHY LTD.

Patent filings per year

Chart showing VISTEC ELECTRON BEAM GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Doering Hans-Joachim 10
#2 Elster Thomas 9
#3 Kirschstein Ulf-Carsten 7
#4 Schubert Gerhard 6
#5 Harnisch Gerd 6
#6 Jackel Christian 6
#7 Heinitz Joachim 6
#8 Risse Stefan 4
#9 Boehm Michael 4
#10 Schenk Christoph 4

Latest patents

Publication Filing date Title
DE102015211090A1 Particle beam device and method for operating a particle beam device
DE102013016738A1 electron beam writer
DE102010035047A1 Method for determining a process proximity effect describing Process Proximity Function for controlling the electron beam exposure of wafers and masks
DE102008062450A1 Arrangement for illuminating a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structural patterns
WO2008031380A1 Method for determining the position of a discoidal substrate relative to a coordinate system of an electron beam exposure system
DE102004058967A1 Method of exposing a substrate to a beam
DE102004052994A1 Multi-beam modulator for a particle beam and use of the multi-beam modulator for maskless substrate structuring
DE102004019834A1 Correction lens system for a particle beam projection device
DE102004019835A1 Illumination condenser for a particle-optical projection system
EP1182508A2 Method of exposing a layout comprising several levels on a wafer