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Particle beam device and method for operating a particle beam device
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electron beam writer
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Method for determining a process proximity effect describing Process Proximity Function for controlling the electron beam exposure of wafers and masks
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Arrangement for illuminating a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structural patterns
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Method for determining the position of a discoidal substrate relative to a coordinate system of an electron beam exposure system
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Method of exposing a substrate to a beam
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Multi-beam modulator for a particle beam and use of the multi-beam modulator for maskless substrate structuring
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Correction lens system for a particle beam projection device
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Illumination condenser for a particle-optical projection system
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Method of exposing a layout comprising several levels on a wafer
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