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GB0427961D0
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Dual-mode electron beam column
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DE102004055149A1
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Apparatus and method for imaging a multiple particle beam onto a substrate
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DE102004052995A1
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Device for structuring a particle beam
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DE102004048892A1
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Illuminating system for a corpuscular beam device and method for illuminating with a corpuscular beam
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US2006043311A1
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Thermal compensation in magnetic field influencing of an electron beam
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EP1612835A1
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Method for Reducing the Fogging Effect
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EP1612834A1
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A process for controlling the proximity effect correction
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EP1612833A1
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Method for reducing the fogging effect
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DE102004019833A1
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Objective lens for a charged particle beam and its use
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DE102004018147A1
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Device and method for producing resist profiles
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GB0323079D0
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Stage for a workpiece
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GB0320292D0
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Thermal compensation in magnetic field influencing of an electron beam
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GB0318118D0
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Pattern-writing equipment
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GB0318119D0
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Dual-mode electron beam lithography machine
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WO03081171A1
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Device and method for maskless afm microlithography
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DE10303040A1
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Device and method for maskless microlithography
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GB0301730D0
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Cooling of a device for influencing an electron beam
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GB0219608D0
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Substrate loading and unloading apparatus
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GB0212784D0
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Device for influencing an electron beam
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GB0126977D0
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Electron beam lithography machine
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