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MAPPER LITHOGRAPHY IP BV

Overview
  • Total Patents
    827
  • GoodIP Patent Rank
    6,682
  • Filing trend
    ⇩ 80.0%
About

MAPPER LITHOGRAPHY IP BV has a total of 827 patent applications. It decreased the IP activity by 80.0%. Its first patent ever was published in 2000. It filed its patents most often in WIPO (World Intellectual Property Organization), Taiwan and Republic of Korea. Its main competitors in its focus markets electrical machinery and energy, micro-structure and nano-technology and optics are ION DIAGNOSTICS INC, MEPPER LITOGRAFI AJPI B V and ARRADIANCE INC.

Patent filings per year

Chart showing MAPPER LITHOGRAPHY IP BVs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wieland Marco Jan-Jaco 147
#2 Kruit Pieter 142
#3 De Boer Guido 136
#4 Steenbrink Stijn Willem Herman Karel 86
#5 Van Veen Alexander Hendrik Vincent 80
#6 Vergeer Niels 79
#7 Wieland Marco Jan Jaco 56
#8 Jager Remco 55
#9 Van De Peut Teunis 51
#10 Koning Johan Joost 49

Latest patents

Publication Filing date Title
WO2019045087A1 Memory device with predetermined start-up value
WO2019049588A1 Methods and systems for clamping a substrate
US2018277334A1 Aberration correction in charged particle system
CN110249408A Safety chip with sequence number
CN110325919A Adjust component and the substrate exposure system including the adjustment component
TW201820050A Fabricating unique chips using a charged particle multi-beamlet lithography system
NL2019502A Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system
NL2019503A Fabricating unique chips using a charged particle multi-beamlet lithography system
NL2019504A Secure chips with serial numbers
TW201812429A Substrate holding device, method for manufacturing such a device, and apparatus and method for processing or imaging a sample
NL2018368B1 Data generation for fabricating unique chips using a charged particle multi-beamlet lithography system
NL2018196B1 Control system and method for lithography apparatus
NL2018108B1 Adjustment assembly and substrate exposure system comprising such an adjustment assembly
US2018188659A1 Adjustment assembly and substrate exposure system comprising such an adjustment assembly
US10008362B1 Optical fiber feedthrough device and fiber path arrangement
NL2018086B1 Optical fiber feedthrough device and fiber path arrangement
US2018068047A1 Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system
JP2018066894A Method and device for positioning substrate on substrate support unit
GB201617755D0 Method and apparatus for aligning substrates on a substrate support unit
US2018113386A1 Method and apparatus for aligning substrates on a substrate support unit