|
US2016276132A1
|
|
Multi-beam writing of pattern areas of relaxed critical dimension
|
|
EP3070528A1
|
|
Multi-beam writing of pattern areas of relaxed critical dimension
|
|
EP3096342A1
|
|
Bi-directional double-pass multi-beam writing
|
|
US2016071684A1
|
|
Correction of short-range dislocations in a multi-beam writer
|
|
EP2993684A1
|
|
Correction of short-range dislocations in a multi-beam writer
|
|
KR20170009606A
|
|
Compensation of defective beamlets in a charged-particle multi-beam exposure tool
|
|
KR20170009608A
|
|
Compensation of dose inhomogeneity using overlapping exposure spots
|
|
JP2016029715A
|
|
Compensation for imaging deflection in particle beam drawing machine using convolution kernel
|
|
US2015311030A1
|
|
Multi-beam tool for cutting patterns
|
|
US2015311031A1
|
|
Multi-Beam Tool for Cutting Patterns
|
|
US2015069260A1
|
|
Charged-particle multi-beam apparatus having correction plate
|
|
EP2830083A1
|
|
Method for charged-particle multi-beam exposure
|
|
JP2015023286A
|
|
Pattern definition device having multiple blanking arrays
|
|
EP2757571A1
|
|
High-voltage insulation device for charged-particle optical apparatus
|
|
JP2011199279A
|
|
Method for multibeam exposure on target
|
|
EP2317535A2
|
|
Pattern definition device with multiple multibeam array
|
|
EP2251893A2
|
|
Multi-beam deflector array means with bonded electrodes
|
|
EP2228817A2
|
|
Global point spreading function in multi-beam patterning
|
|
EP2214194A1
|
|
Method for producing a multi-beam deflector array device having electrodes
|
|
EP2190003A2
|
|
Constant current multi-beam patterning
|
