PARAM CORP has a total of 18 patent applications. Its first patent ever was published in 2011. It filed its patents most often in WIPO (World Intellectual Property Organization), China and EPO (European Patent Office). Its main competitors in its focus markets electrical machinery and energy, micro-structure and nano-technology and semiconductors are LEICA LITHOGRAPHY SYSTEMS LTD, IMS NANOFABRICATION GMBH and KRUIT PIETER.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 5 | |
#2 | China | 3 | |
#3 | EPO (European Patent Office) | 3 | |
#4 | Republic of Korea | 3 | |
#5 | Taiwan | 2 | |
#6 | United States | 2 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Micro-structure and nano-technology | |
#3 | Semiconductors |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Nanostructure applications | |
#3 | Semiconductor devices |
# | Name | Total Patents |
---|---|---|
#1 | Yasuda Hiroshi | 18 |
#2 | Ooae Yoshihisa | 2 |
#3 | Murata Hidekazu | 2 |
#4 | Shibaoka Tatsuya | 2 |
Publication | Filing date | Title |
---|---|---|
WO2021015039A1 | Electron gun device | |
CN103858211A | Electron beam lithography device and lithographic method | |
WO2012057166A1 | Electron lens and the electron beam device | |
KR20140044310A | Electron gun and electron beam device |