WIELAND MARCO JAN-JACO has a total of 18 patent applications. Its first patent ever was published in 2007. It filed its patents most often in United States. Its main competitors in its focus markets electrical machinery and energy, micro-structure and nano-technology and optics are IMS NANOFABRICATION AG, NFAB LTD and LEICA LITHOGRAPHY SYSTEMS LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 18 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Micro-structure and nano-technology | |
#3 | Optics | |
#4 | Computer technology | |
#5 | Semiconductors |
# | Name | Total Patents |
---|---|---|
#1 | Wieland Marco Jan-Jaco | 18 |
#2 | Van Veen Alexander Hendrik Vincent | 12 |
#3 | Jager Remco | 5 |
#4 | Steenbrink Stijn Willem Herman Karel | 5 |
#5 | Van De Peut Teunis | 4 |
#6 | Kruit Pieter | 4 |
#7 | Kampherbeek Bert Jan | 3 |
#8 | Derks Henk | 2 |
#9 | De Jong Hendrik Jan | 1 |
#10 | Van Melle Ralph | 1 |
Publication | Filing date | Title |
---|---|---|
US2015242563A1 | Enhanced stitching by overlap dose and feature reduction | |
US2013120724A1 | Method for splitting a pattern for use in a multi-beamlet lithography apparatus | |
US2012287410A1 | Data path for lithography apparatus | |
US2012091358A1 | Projection lens arrangement |