| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United Kingdom | 4 | |
| #2 | WIPO (World Intellectual Property Organization) | 4 | |
| #3 | EPO (European Patent Office) | 3 | |
| #4 | Israel | 1 | |
| #5 | Taiwan | 1 | |
| #6 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Micro-structure and nano-technology | |
| #3 | Machines |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Nanostructure applications | |
| #3 | Unspecified technologies |
| # | Name | Total Patents |
|---|---|---|
| #1 | Hughes Barrie James | 6 |
| #2 | King David Martin Platton | 4 |
| #3 | Sturrock John Monro | 3 |
| #4 | Zhang Tao | 2 |
| #5 | George David Sydney | 2 |
| #6 | Chisholm Thomas | 2 |
| #7 | Dean Andrew | 2 |
| #8 | Rosolen Grahame Craig | 1 |
| #9 | Sturrock John Munro | 1 |
| #10 | Mitchell Peter Gerald | 1 |
| Publication | Filing date | Title |
|---|---|---|
| GB9716388D0 | Method of and machine for pattern writing by an electron beam | |
| GB9710019D0 | Electron beam aperture element | |
| GB9708459D0 | Pattern-writing machine | |
| GB9600166D0 | Electron beam pattern-writing column | |
| US5786601A | Electron beam lithography machine |