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SUPER SILICON KENKYUSHO KK

Overview
  • Total Patents
    255
About

SUPER SILICON KENKYUSHO KK has a total of 255 patent applications. Its first patent ever was published in 1996. It filed its patents most often in Japan and Taiwan. Its main competitors in its focus markets machines, surface technology and coating and semiconductors are SUPER SILICON CRYSTAL RES INST, MEMC ELECTRONIC MATERIALS SPA and WACKER SILTRONIC HALBLEITERMAT.

Patent filings in countries

World map showing SUPER SILICON KENKYUSHO KKs patent filings in countries
# Country Total Patents
#1 Japan 254
#2 Taiwan 1

Patent filings per year

Chart showing SUPER SILICON KENKYUSHO KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Matsubara Junichi 47
#2 Yamagishi Hirotoshi 45
#3 Imai Masato 40
#4 Mayuzumi Masanori 38
#5 Inoue Kazutoshi 37
#6 Nakahara Shinji 37
#7 Kuramoto Makoto 36
#8 Shiraishi Yutaka 36
#9 Machida Tsunehisa 35
#10 Iida Akihiro 34

Latest patents

Publication Filing date Title
JP2002210649A Haze reducing method of semiconductor wafer
JP2002217151A Method and apparatus for polishing semiconductor wafer
JP2002217152A Comprehensive polishing and cleaning method of wafer
JP2002203824A Method for cleaning wafer
JP2002198345A Cleaning method of semiconductor wafer
JP2002166357A Wafer polishing method
JP2002158202A Wafer cleaner
JP2002158201A Cleaner for semiconductor wafers
JP2002151416A Epitaxial growth apparatus
JP2002137991A Method of manufacturing single crystal and device of pulling up single crystal
JP2002137998A Method of pulling up single crystal
JP2002137990A Method of manufacturing single crystal and device for pulling up single crystal
JP2002137988A Method of pull up single crystal
JP2002137997A Device for pulling up single crystal
JP2002134423A Epitaxial growth system
JP2002128595A Epitaxial growth device
JP2002151455A Cleaning apparatus for semiconductor wafer
JP2002110594A Wafer surface polishing method
JP2002075951A Washer for semiconductor wafer
JP2002057131A Mechanism for controlling shape of surface table for wafer polishing