SUPER SILICON CRYSTAL RES INST has a total of 65 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets machines, surface technology and coating and semiconductors are KOMATSU DENSHI KINZOKU KK, KOMATSU ELECTRONICS METALS CO and SUPER SILICON KENKYUSHO KK.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 24 | |
#2 | WIPO (World Intellectual Property Organization) | 16 | |
#3 | EPO (European Patent Office) | 14 | |
#4 | Germany | 6 | |
#5 | Taiwan | 4 | |
#6 | United Kingdom | 1 |
# | Industry | |
---|---|---|
#1 | Machines | |
#2 | Surface technology and coating | |
#3 | Semiconductors | |
#4 | Machine tools | |
#5 | Measurement | |
#6 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Imai Masato | 16 |
#2 | Inoue Kazutoshi | 14 |
#3 | Mayusumi Masanori | 14 |
#4 | Nakahara Shinji | 14 |
#5 | Asakawa Keiichiro | 12 |
#6 | Oishi Hiroshi | 12 |
#7 | Shiraishi Yutaka | 10 |
#8 | Kuramoto Makoto | 7 |
#9 | Abe Kohzo | 7 |
#10 | Yamagishi Hirotoshi | 6 |
Publication | Filing date | Title |
---|---|---|
WO0014309A1 | Apparatus for growing single crystal | |
WO9943875A1 | Epitaxial growth apparatus | |
US6361597B1 | Single crystal material auxiliary melting apparatus and single crystal material melting method | |
WO9926280A1 | Device for holding semiconductor wafer | |
US6262393B1 | Epitaxial growth furnace | |
EP0940484A1 | Single crystal pulling apparatus | |
EP0867533A2 | Single crystal growing apparatus ans single crystal growing method | |
WO9844175A1 | Epitaxial growth furnace | |
TW358764B | A method of double-side lapping a wafer and an apparatus therefor | |
US6245152B1 | Method and apparatus for producing epitaxial wafer |