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MEMC ELECTRONIC MATERIALS SPA

Overview
  • Total Patents
    51
About

MEMC ELECTRONIC MATERIALS SPA has a total of 51 patent applications. Its first patent ever was published in 1991. It filed its patents most often in Taiwan, United States and Italy. Its main competitors in its focus markets machines, semiconductors and surface technology and coating are WACKER SILTRONIC, WACKER SILTRONIC HALBLEITERMAT and SUMITOMO MITSUBISHI SILICON.

Patent filings in countries

World map showing MEMC ELECTRONIC MATERIALS SPAs patent filings in countries
# Country Total Patents
#1 Taiwan 33
#2 United States 15
#3 Italy 1
#4 Japan 1
#5 Republic of Korea 1

Patent filings per year

Chart showing MEMC ELECTRONIC MATERIALS SPAs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Falster Robert 8
#2 Olmo Massimiliano 7
#3 Erk Henry F 6
#4 Bovio Ezio 5
#5 Falster Robert J 5
#6 Corbellini Paride 4
#7 Gambaro Daniela 4
#8 Negri Giovanni 4
#9 Cornara Marco 4
#10 Fisher Graham 3

Latest patents

Publication Filing date Title
US2013174828A1 Systems and Methods For Controlling Surface Profiles Of Wafers Sliced In A Wire Saw
US2013014738A1 Saw For Cutting Silicon Into Seed Rods For Use In A Chemical Vapor Deposition Polysilicon Reactor
US2013000672A1 Cleaning tool for polysilicon reactor
US6803576B2 Analytical method to measure nitrogen concentration in single crystal silicon
TW538112B Method for treating an exhausted glycol-based slurry
TW466625B Polishing mixture and process for reducing the incorporation of copper into silicon wafers
TW476815B Low defect density, ideal oxygen precipitating silicon wafer and process for the preparation thereof
US5994761A Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
TW363903B Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine
US5401669A Process for the preparation of silicon wafers having controlled distribution of oxygen precipitate nucleation centers
US5272119A Process for contamination removal and minority carrier lifetime improvement in silicon