| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Australia | 5 | |
| #2 | WIPO (World Intellectual Property Organization) | 5 | |
| #3 | China | 2 | |
| #4 | Japan | 1 | |
| #5 | Taiwan | 1 | |
| #6 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Micro-structure and nano-technology | |
| #3 | Semiconductors | |
| #4 | Optics | |
| #5 | Machines | |
| #6 | Engines, pumps and turbines | |
| #7 | Environmental technology |
| # | Name | Total Patents |
|---|---|---|
| #1 | Parker N William | 9 |
| #2 | Yin Edward M | 6 |
| #3 | Brodie Alan D | 4 |
| #4 | Matter Michael C | 4 |
| #5 | Lee Martin E | 3 |
| #6 | Andeen Gerry B | 3 |
| #7 | Parker Norman William | 2 |
| #8 | Miller S Daniel | 2 |
| #9 | Cavan Daniel L | 2 |
| #10 | Guo George | 2 |
| Publication | Filing date | Title |
|---|---|---|
| WO0139243A1 | Electron optics for multi-beam electron beam lithography tool | |
| WO0135165A1 | Data path design for multiple electron beam lithography system | |
| AU4135901A | Data path design for multiple electron beam lithography system | |
| AU1570501A | Momentum acceleration orthogonal time of flight mass spectrometer | |
| US5637951A | Electron source for multibeam electron lithography system |