| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 7 | |
| #2 | WIPO (World Intellectual Property Organization) | 7 | |
| #3 | Germany | 3 | |
| #4 | Taiwan | 3 | |
| #5 | China | 1 | |
| #6 | Republic of Korea | 1 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Optics | |
| #3 | Measurement | |
| #4 | Micro-structure and nano-technology | |
| #5 | Chemical engineering | |
| #6 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Anazawa Norimichi | 12 |
| #2 | Nitta Jun | 7 |
| #3 | Yonezawa Akira | 6 |
| #4 | Santo Izumi | 5 |
| #5 | Kobayashi Ken-Ichi | 4 |
| #6 | Takahashi Katuyuki | 4 |
| #7 | Ataka Masashi | 3 |
| #8 | Jinriki Tatenori | 3 |
| #9 | Hisatsugu Tokushige | 2 |
| #10 | Takahashi Katsuyuki | 2 |
| Publication | Filing date | Title |
|---|---|---|
| TW200801795A | Stencil mask | |
| WO2006135021A1 | Charged particle beam equipment and method for creating charged particle beam image | |
| US2009212660A1 | Ultrasonic motor and method for manufacturing ultrasonic motor | |
| WO2006107049A1 | Mask inspecting method and mask inspecting apparatus | |
| WO2006098266A1 | Mask cleaning method | |
| US6686591B2 | Apparatus for inspecting mask |