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NUFLARE TECHNOLOGY INC

Overview
  • Total Patents
    2,763
  • GoodIP Patent Rank
    1,016
  • Filing trend
    ⇧ 1.0%
About

NUFLARE TECHNOLOGY INC has a total of 2,763 patent applications. It increased the IP activity by 1.0%. Its first patent ever was published in 2002. It filed its patents most often in Japan, United States and Republic of Korea. Its main competitors in its focus markets electrical machinery and energy, optics and semiconductors are MAPPER LITHOGRAPHY IP BV, MULTIBEAM SYSTEMS INC and MICROBEAM INC.

Patent filings in countries

World map showing NUFLARE TECHNOLOGY INCs patent filings in countries
# Country Total Patents
#1 Japan 1,300
#2 United States 567
#3 Republic of Korea 393
#4 Taiwan 358
#5 China 70
#6 Germany 48
#7 WIPO (World Intellectual Property Organization) 23
#8 EPO (European Patent Office) 4

Patent filings per year

Chart showing NUFLARE TECHNOLOGY INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Ogasawara Munehiro 154
#2 Suzuki Kunihiko 150
#3 Matsumoto Hiroshi 133
#4 Kato Yasuo 118
#5 Ito Hideki 111
#6 Sato Yuusuke 100
#7 Kikuiri Nobutaka 96
#8 Ogawa Riki 95
#9 Tsuchiya Hideo 89
#10 Yasui Kenichi 89

Latest patents

Publication Filing date Title
US2021074510A1 Multi charged particle beam evaluation method and multi charged particle beam writing device
WO2021033714A1 Drawing device and deflector
WO2021039419A1 Electron gun and electron beam irradiation device
WO2021033528A1 Vacuum device
US2021027986A1 Multi-beam writing method and multi-beam writing apparatus
US2021027987A1 Multi-beam writing method and multi-beam writing apparatus
WO2021010152A1 Method for inspecting conduction of multipole aberration corrector, and conduction inspection device for inspecting conduction of multipole aberration corrector
WO2021024648A1 Electron beam inspection device and electron beam inspection method
KR20210007847A Multi-beam writing method and multi-beam writing apparatus
US2021010959A1 Inspection apparatus and inspection method
KR20210007843A Multi-beam writing method and multi-beam writing apparatus
WO2020226058A1 Vapor phase growth method and vapor phase growth device
WO2020213503A1 SiC EPITAXIAL GROWTH APPARATUS
US2020292299A1 Growth rate detection apparatus, vapor deposition apparatus, and vapor deposition rate detection method
TW202101508A Multiple electron beams irradiation apparatus
US2020211812A1 Multiple electron beams irradiation apparatus
JP2020042035A Pattern inspection device and pattern inspection method
KR20200141494A Charged particle beam drawing apparatus, charged particle beam drawing method and program
JP2019204975A Vapor growth device and vapor phase epitaxy method
JP2019186584A Multi-charged particle beam drawing apparatus and multi-charged particle beam drawing method