| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 5 | |
| #2 | Taiwan | 2 | |
| #3 | WIPO (World Intellectual Property Organization) | 2 | |
| #4 | Australia | 1 | |
| #5 | Germany | 1 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Optics | |
| #3 | Micro-structure and nano-technology | |
| #4 | Engines, pumps and turbines |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Photomechanical semiconductor production | |
| #3 | Nanostructure applications | |
| #4 | X-ray microscopes |
| # | Name | Total Patents |
|---|---|---|
| #1 | Utsumi Takao | 4 |
| #2 | Nozue Hiroshi | 3 |
| #3 | Shimazu Nobuo | 3 |
| #4 | Yoshida Akira | 2 |
| #5 | Higuchi Akira | 2 |
| Publication | Filing date | Title |
|---|---|---|
| WO2004068565A1 | Mask for charged particle exposure | |
| US2004004195A1 | Mask inspecting apparatus | |
| US6727507B2 | Electron beam proximity exposure apparatus and method | |
| US6894295B2 | Electron beam proximity exposure apparatus and mask unit therefor | |
| US6703623B1 | Electron beam proximity exposure apparatus |