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LAM RES AG

Overview
  • Total Patents
    479
  • GoodIP Patent Rank
    7,403
  • Filing trend
    ⇩ 48.0%
About

LAM RES AG has a total of 479 patent applications. It decreased the IP activity by 48.0%. Its first patent ever was published in 2001. It filed its patents most often in Taiwan, Republic of Korea and United States. Its main competitors in its focus markets semiconductors, machines and chemical engineering are STRATEDGE CORP, SERIZAWA SEIICHI and AEGIS INC.

Patent filings per year

Chart showing LAM RES AGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Gleissner Andreas 60
#2 Obweger Rainer 57
#3 Brugger Michael 52
#4 Wirnsberger Thomas 43
#5 Lach Otto 34
#6 Puggl Michael 30
#7 Kumnig Franz 29
#8 Tschinderle Ulrich 29
#9 Lippert Alexander 27
#10 Schwarzenbacher Reinhold 27

Latest patents

Publication Filing date Title
GB202102290D0 Apparatus for processing a wafer-shaped article
GB202101428D0 Apparatus for dispensing a liquid
GB202016750D0 Apparatus for processing a wafer-shaped article
GB202015527D0 Apparatus for processing wafer-shaped articles
GB202012725D0 Apparatus for processing a wafer-shaped article
GB202002798D0 Apparatus for processing a wafer
WO2020072278A1 Gas mixture including hydrogen fluoride, alcohol and an additive for preventing stiction of and/or repairing high aspect ratio structures
TW202025229A Vapor delivery head for preventing stiction of high aspect ratio structures and/or repairing high aspect ratio structures
GB201901637D0 Apparatus for processing a wafer, and method of controlling such an apparatus
GB201900912D0 Apparatus for processing a wafer, and method of controlling such an apparatus
GB201820270D0 Method and apparatus for treating semiconductor substrate
WO2019083735A1 Systems and methods for preventing stiction of high aspect ratio structures and/or repairing high aspect ratio structures
GB201815163D0 Wafer washing method and apparatus
GB201813368D0 Etchant composition
GB201805900D0 Wet etching of glass sustrates
GB201804881D0 Method of producing rinsing liquid
US2019051541A1 Spin chuck with concentrated center and radial heating
US2019010397A1 Liquid mixture and method for etching a substrate using the liquid mixture
US2018347053A1 Passivation mixture and systems and methods for selectively passivating substrate materials including germanium or type III-IV materials using the passivation mixture
US2018337069A1 Systems and methods for detecting undesirable dynamic behavior of liquid dispensed onto a rotating substrate