ASML HOLDINGS N V has a total of 17 patent applications. Its first patent ever was published in 2000. It filed its patents most often in United States, EPO (European Patent Office) and China. Its main competitors in its focus markets optics, semiconductors and control are ZEISS CARL SMT AG, NIKON CORP KABUSHIKI KAISHA NIKON and KULICKE & SOFFA LITEQ B V.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 14 | |
#2 | EPO (European Patent Office) | 2 | |
#3 | China | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Semiconductors | |
#3 | Control | |
#4 | Surface technology and coating | |
#5 | Environmental technology | |
#6 | Machines | |
#7 | IT methods for management | |
#8 | Measurement | |
#9 | Materials and metallurgy |
# | Name | Total Patents |
---|---|---|
#1 | Oh Hilario | 3 |
#2 | Hansen Matthew E | 2 |
#3 | Gurer Emir | 2 |
#4 | Gajdeczko Boguslaw | 1 |
#5 | Krishna Murthy | 1 |
#6 | Wilklow Ronald A | 1 |
#7 | Salois John | 1 |
#8 | Best Keith | 1 |
#9 | Violette Kevin J | 1 |
#10 | Ryzhikov Lev | 1 |
Publication | Filing date | Title |
---|---|---|
US2005264782A1 | System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions | |
US2005217384A1 | Pressure sensor | |
US7531040B2 | Resist recovery method | |
US6689215B2 | Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface | |
US2004058061A1 | Method for protection of adhesives used to secure optics from ultra-violet light | |
US2002159152A1 | Methods for optical beam shaping and diffusing | |
US2002021460A1 | Method for characterizing optical systems using holographic reticles | |
US6865437B1 | Robot pre-positioning in a wafer processing system | |
US6678572B1 | Recipe cascading in a wafer processing system |