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ZEISS CARL SMT AG

Overview
  • Total Patents
    2,528
  • GoodIP Patent Rank
    241,758
About

ZEISS CARL SMT AG has a total of 2,528 patent applications. Its first patent ever was published in 1992. It filed its patents most often in Germany, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, measurement and micro-structure and nano-technology are ZEISS CARL SMT GMBH, SHANGHAI MICROELECTRONIC EQUIP and NIKON CORP KABUSHIKI KAISHA NIKON.

Patent filings per year

Chart showing ZEISS CARL SMT AGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Ulrich Wilhelm 207
#2 Singer Wolfgang 195
#3 Gruner Toralf 165
#4 Mann Hans-Juergen 163
#5 Dodoc Aurelian 158
#6 Fiolka Damian 158
#7 Schuster Karl-Heinz 141
#8 Wangler Johannes 129
#9 Epple Alexander 128
#10 Holderer Hubert 108

Latest patents

Publication Filing date Title
DE102018202039A1 Method for the projection lithographic transmission of an object structure arranged in an object field
JP2010251801A Euv projection lens with mirror comprising material having different inclination sign against temperature rise according to thermal expansion coefficient around zero transition temperature
JP2010226123A Mask, lithographic apparatus and semiconductor component
JP2010261934A Method and device for measuring deviation of optical test surface from target shape
DE102010003169A1 Field facet mirror for use in illumination lens in illumination system of projection exposure system, during extreme UV-projection-lithography to manufacture semiconductor chip, has reference bodies arranged in reference levels with vectors
DE102010003167A1 Method for operating microlithographic projection lighting apparatus, involves arranging mask in object plane of projection objective, where lighting setting, adjusted in lighting device, is changed dynamically
CN102449526A Imaging optics and projection exposure installation for microlithography with imaging optics of this type
CN102341738A Imaging optics and projection exposure installation for microlithography with imaging optics of this type
DE102010002298A1 Projection exposure apparatus for semiconductor lithography with a cooling device
GB201001888D0 Optical element module with imaging error correction and position adjustment
DE102010004827A1 Relay lens e.g. catadioptric microscope objectives, for use with pupil relay system for e.g. projection of pupil, has concave and convex mirrors arranged such that rays path is reflectable at concave mirror and at convex mirror
DE102009054869A1 Mirror for guiding a radiation beam
DE102009054868A1 Control pressure adjusting method for pneumatically operatable bellow that is utilized for e.g. positioning lens for manipulator of projection system, involves transmitting working pressure for actuator elements in to control pressure
DE102009047460A1 Method for cutting a blank from a boule of an ultra-low expansion glass material containing a stria comprises cutting the blank from the boule so that one axis of the blank runs at a specified angle to the preferred direction of the stria
DE102009047399A1 Vacuum chamber for the reception of a component, comprises a first gas tightly sealable reception area, a reception device for the component, and a second reception area arranged within the first reception area
DE102009047316A1 Optical reflective component for inserting in illuminating optics of illuminating system for illuminating object field of projection illumination system, has static structures on reflective upper surface
DE102009047180A1 Facet mirror for use in extreme ultraviolet lithography, has facet which consists of multilayer structure, where multilayer structure is designed for reflection of electromagnetic radiation in extreme ultraviolet wavelength range
DE102009052739A1 Measuring system for determining the position of a reflective optical component in a micro-lithography projection illumination facility has a unit as a source of light to measure rays
DE102009044462A1 Optical element for filtering electromagnetic radiations for illuminating system of projection exposure system, has multilayer structure, which is designed for reflection of electromagnetic radiations in extreme ultraviolet wavelength range
CN102257421A Optical module for guiding a radiation beam