| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 27 | |
| #2 | WIPO (World Intellectual Property Organization) | 7 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Semiconductors | |
| #3 | Measurement | |
| #4 | Engines, pumps and turbines |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Optical systems | |
| #3 | Nonlinear optics | |
| #4 | Cameras | |
| #5 | Semiconductor devices | |
| #6 | Analysing materials | |
| #7 | Testing of structures | |
| #8 | X-ray microscopes |
| # | Name | Total Patents |
|---|---|---|
| #1 | Fiolka Damian | 34 |
| #2 | Deguenther Markus | 9 |
| #3 | Maul Manfred | 5 |
| #4 | Scholz Axel | 3 |
| #5 | Totzeck Michael | 3 |
| #6 | Schwab Markus | 2 |
| #7 | Hartjes Joachim | 2 |
| #8 | Seitz Wolfgang | 2 |
| #9 | Scharnweber Ralf | 2 |
| #10 | Saenger Ingo | 2 |
| Publication | Filing date | Title |
|---|---|---|
| WO2006131517A2 | Illuminating device of a microlithographic projection exposure system | |
| US2006291057A1 | Polarization-modulating optical element | |
| US2007019179A1 | Polarization-modulating optical element | |
| WO2006040184A2 | Illumination system for a microlithographic projection exposure apparatus | |
| US2005237623A1 | Optical unit for an illumination system of a microlithographic projection exposure apparatus |