| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 3 | |
| #2 | Taiwan | 3 | |
| #3 | United States | 3 | |
| #4 | WIPO (World Intellectual Property Organization) | 3 | |
| #5 | China | 2 | |
| #6 | EPO (European Patent Office) | 2 | |
| #7 | Netherlands | 2 | |
| #8 | Singapore | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Semiconductors |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Optical systems | |
| #3 | Semiconductor devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Vermeer Adrianus Johannes Petrus Maria | 12 |
| #2 | Kort Derk Andre | 9 |
| #3 | Loktev Mikhail Yurievich | 7 |
| #4 | Derk Andre Kort | 2 |
| #5 | Loktev Mikhail Yurlevitch | 2 |
| #6 | Dilworth Donald Charles | 2 |
| #7 | Mikhail Yurievich Loktev | 2 |
| #8 | Vermeer Adrianus Johannes | 2 |
| #9 | Adrianus Johannes Petrus Maria Vermeer | 2 |
| #10 | De Boeij Jeroen | 1 |
| Publication | Filing date | Title |
|---|---|---|
| WO2020207656A1 | Lithographic systems and methods of operating the same | |
| NL2018926B1 | Light beam diffuser system and method | |
| KR20180125457A | Lithographic apparatus and method for preventing peripheral exposure of a substrate | |
| NL2017493B1 | Optical beam homogenizer based on a lens array | |
| TW201602733A | Photolithography apparatus comprising projection system for control of image size |