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ZEISS CARL SMT GMBH

Overview
  • Total Patents
    5,351
  • GoodIP Patent Rank
    452
  • Filing trend
    ⇩ 11.0%
About

ZEISS CARL SMT GMBH has a total of 5,351 patent applications. It decreased the IP activity by 11.0%. Its first patent ever was published in 2000. It filed its patents most often in Germany, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, measurement and engines, pumps and turbines are ZEISS CARL SMT AG, SHANGHAI MICROELECTRONIC EQUIP and KULICKE & SOFFA LITEQ B V.

Patent filings per year

Chart showing ZEISS CARL SMT GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Patra Michael 316
#2 Gruner Toralf 305
#3 Bittner Boris 188
#4 Deguenther Markus 187
#5 Hartjes Joachim 176
#6 Endres Martin 161
#7 Wabra Norbert 153
#8 Hauf Markus 151
#9 Mann Hans-Juergen 146
#10 Ehm Dirk Heinrich 142

Latest patents

Publication Filing date Title
US2021097673A1 Root cause analysis for fabrication processes of semiconductor structures
DE102020123615A1 Method and device for characterizing a mask for microlithography
WO2021018725A1 Automated operational control of micro-tooling devices
DE102020208657A1 CLEAN ROOM TRANSPORT AND STORAGE SYSTEM
DE102020208500A1 WATER-BASED SYSTEM AND LITHOGRAPHY SYSTEM
DE102020207748A1 Optical system, especially in a microlithographic projection exposure system
DE102020207750A1 Assembly in an optical system, in particular in a microlithographic projection exposure system
DE102020207099A1 Method and device for manufacturing an optical element
WO2020254086A1 Method for determining a temperature-dependent change in length of a sample
DE102020206695A1 Device and method for reducing vibrations caused by gas bubbles in the temperature control fluid in microlithographic projection exposure systems
WO2020244795A1 Cross section imaging with improved 3d volume image reconstruction accuracy
WO2020221763A1 Measuring illumination optical unit for guiding illumination light into an object field of a projection exposure system for euv lithography
DE102020205188A1 Mirror for an optical system
DE102020205085A1 COOLING OF AN OPTICAL ELEMENT
DE102020205117A1 Tilting device and projection exposure system
DE102020205075A1 Device and method for coolant-cooled grinding and measuring of an aspherical lens
DE102020204968A1 METHOD AND DEVICE FOR REVIEWING REPORT CONTENTS OF SEVERAL REPORT DOCUMENTS
DE102020204722A1 OPTICAL SYSTEM, LITHOGRAPHY SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
DE102020204665A1 Method for manufacturing a heat sink for an assembly of an optical system
DE102020204426A1 Method and device for manipulating the surface shape of an optical element