ANJI MICROELECTRONICS CO LTD innovation strategy

Patent filings in countries

#	Industry
#1	Basic materials chemistry
#2	Semiconductors
#3	Optics
#4	Surface technology and coating
#5	Environmental technology
#6	Machine tools

#	Technology
#1	Semiconductor devices
#2	Polishing compositions
#3	Photomechanical semiconductor production
#4	Soaps
#5	Materials for miscellaneous applications
#6	Metallic material removal
#7	Metallic material cleaning
#8	Climate change mitigation in goods production
#9	Grinding or polishing devices
#10	Inorganic treatment materials

Publication	Filing date	Title
CN103666276A	2012-09-25	Chemical-mechanical polishing solution
CN103450810A	2012-05-30	Chemical mechanical planarization slurry and applications thereof
CN103382368A	2012-05-03	Chemical machinery planarization slurry
CN103293882A	2012-02-23	Photoresist cleanout fluid
CN103205205A	2012-01-16	Alkaline chemical-mechanical polishing solution
CN103184009A	2011-12-27	Chemical mechanical polishing liquid
CN103173127A	2011-12-23	Chemical mechanical polishing liquid for flatting through silicon via blocking layers
CN103160207A	2011-12-16	Metal chemico-mechanical polishing sizing agent and application thereof
TW201226495A	2011-12-15	Chemical mechanical planarization slurry for polishing silicon and copper
TW201226553A	2011-12-15	Cleaning liquid for thick film photoresists
TW201226493A	2011-12-15	Chemical mechanical polishing slurry for polishing tungsten
TW201226494A	2011-12-15	Chemical mechanical planarization slurry containing organic acid for silicon and copper
CN103146306A	2011-12-07	Polishing solution for TSV barrier layer
TW201217472A	2011-09-22	Chemical mechanical polishing liquid
TW201311882A	2011-09-13	Fluorine-containing cleansing solution
TW201311840A	2011-09-13	Chemical mechanical polishing liquid
TW201311884A	2011-09-13	Photoresist cleaning solution
TW201311874A	2011-09-13	Chemical mechanical polishing liquid
TW201311883A	2011-09-13	Photoresist cleaning liquid
CN102981376A	2011-09-05	Photoresist cleaning solution