LIQUID TECHNOLOGY CO LTD has a total of 11 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Republic of Korea, China and EPO (European Patent Office). Its main competitors in its focus markets optics, basic materials chemistry and semiconductors are YOKOI SHIGERU, MALLINCKRODT BAKER INC and LEE WAI MUN.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 5 | |
#2 | China | 1 | |
#3 | EPO (European Patent Office) | 1 | |
#4 | Japan | 1 | |
#5 | Taiwan | 1 | |
#6 | United States | 1 | |
#7 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Basic materials chemistry | |
#3 | Semiconductors | |
#4 | Macromolecular chemistry and polymers |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Soaps | |
#3 | Semiconductor devices | |
#4 | Compounding ingredients |
# | Name | Total Patents |
---|---|---|
#1 | Choi Ho Sung | 5 |
#2 | Kim Sung Jin | 2 |
#3 | Kim Deok Ho | 2 |
#4 | Jin Kim Sung | 1 |
#5 | Kim Seong Jin | 1 |
#6 | Kim Sung-Jin | 1 |
#7 | Choi Ho-Sung | 1 |
#8 | Kim Deok-Ho | 1 |
Publication | Filing date | Title |
---|---|---|
KR20090045988A | Composition for removing polymer residue of photosensitive and etching resistive film | |
KR20090045987A | Composition for removing a photoresist | |
US2009170741A1 | Composition for removing polymer residue of photosensitive etching-resistant layer | |
KR20070068040A | Composition for removing polymer residue of photosensitive resistive etching film | |
KR20060122188A | Composition of residues removing agent for semiconductor process | |
KR20040098179A | Composition for removal residue of sensitive photoresist |