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DYNALOY LLC

Overview
  • Total Patents
    77
  • GoodIP Patent Rank
    106,228
  • Filing trend
    ⇩ 100.0%
About

DYNALOY LLC has a total of 77 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2005. It filed its patents most often in United States, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, basic materials chemistry and semiconductors are EKC TECHNOLOGY LTD, EKC TECHNOLOGY INC and LEE WAI MUN.

Patent filings per year

Chart showing DYNALOY LLCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Pollard Kimberly Dona 64
#2 Peters Richard Dalton 28
#3 Hochstetler Spencer Erich 27
#4 Phenis Michael T 23
#5 Chan Raymond 20
#6 Acra Travis 20
#7 Phenis Michael Tod 15
#8 Scheele Diane Marie 13
#9 Pfettscher Donald James 13
#10 Goebel Gene 12

Latest patents

Publication Filing date Title
TW201539158A Dynamic multi-purpose composition for the removal of photoresists and method for its use
US2016215240A1 Solutions and processes for removing substances from substrates
US2015325442A1 Formulations of Solutions and Processes for Forming a Substrate Including a Dopant
US2014155310A1 Dynamic multi-purpose composition for the removal of photoresists and method for its use
US2015219996A1 Composition for removing substances from substrates
US2015094249A1 Aqueous solution and process for removing substances from substrates
US2014142017A1 Process and composition for removing substances from substrates
US2014137899A1 Process for removing substances from substrates
US2014138353A1 Process for performing metal lift-off
US2014137894A1 Process for removing substances from substrates
US2014141622A1 Process for etching metals
US2014124896A1 Formulations of solutions and processes for forming a substrate including an arsenic dopant
US2013116159A1 Photoresist and post etch residue cleaning solution
TW201140661A Methods and compositions for doping silicon substrates with molecular monolayers
TW201013336A Stripper solutions effective for back-end-of-line operations
WO2009023675A2 Improved metal conservation with stripper solutions containing resorcinol
US2009036344A1 Reduced metal etch rates using stripper solutions containing a copper salt
WO2008051627A1 Dynamic multi-purpose composition for the removal of photoresists
SG2013081401A Dynamic multi-purpose composition for the removal of photoresists and method for its use
US2007099805A1 Dynamic multi-purpose composition for the removal of photoresists and method for its use