| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 10 | |
| #2 | Japan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Basic materials chemistry | |
| #2 | Semiconductors | |
| #3 | Optics | |
| #4 | Surface technology and coating |
| # | Name | Total Patents |
|---|---|---|
| #1 | Kamimura Tetsuya | 11 |
| #2 | Saie Toshiyuki | 1 |
| #3 | Yoshikawa Masaru | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JP2016221937A | Schedule book for student | |
| US2014030896A1 | Etching method, and etching liquid to be used therein and method of producing a semiconductor substrate product using the same |