ADVANCED MASK TECHNOLOGY CT GMBH has a total of 32 patent applications. Its first patent ever was published in 2005. It filed its patents most often in Japan, EPO (European Patent Office) and United States. Its main competitors in its focus markets optics, micro-structure and nano-technology and electrical machinery and energy are ADVANCED MASK TECHNOLOGY CT GMBH & CO KG, EUV LLC and MICRO RESIST TECHNOLOGY GMBH.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 9 | |
#2 | EPO (European Patent Office) | 7 | |
#3 | United States | 7 | |
#4 | Germany | 4 | |
#5 | Republic of Korea | 4 | |
#6 | Taiwan | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Micro-structure and nano-technology | |
#3 | Electrical machinery and energy | |
#4 | Machines | |
#5 | Semiconductors | |
#6 | Measurement |
# | Name | Total Patents |
---|---|---|
#1 | Sczyrba Martin | 10 |
#2 | Dersch Uwe | 8 |
#3 | Waiblinger Markus | 8 |
#4 | Bubke Karsten | 7 |
#5 | Feicke Axel | 5 |
#6 | Holfeld Christian | 4 |
#7 | Haffner Henning | 4 |
#8 | Chovino Christian | 3 |
#9 | Rolff Haiko | 3 |
#10 | Nesladek Pavel | 3 |
Publication | Filing date | Title |
---|---|---|
DE102009017952A1 | Lithographic mask and method of making the lithographic mask | |
DE102007028172B3 | EUV mask and procedure for repairing an EUV mask | |
DE102007023034A1 | Dummy blank and method for determining a blank layer | |
EP1857879A1 | An illumination system and a photolithography apparatus | |
EP1857876A1 | Method of forming a phase shift mask | |
EP1832927A1 | A test pattern and a method of evaluating the transfer properties of a test pattern | |
EP1804034A1 | A system for monitoring the position of a nozzle | |
EP1788445A1 | A method of determining an exposure dose and exposure apparatus | |
EP1777587A1 | A method of cleaning a surface of a photomask | |
EP1710623A1 | Method of cleaning a substrate surface from a crystal nucleus |