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ADVANCED MASK TECHNOLOGY CT GMBH

Overview
  • Total Patents
    32
About

ADVANCED MASK TECHNOLOGY CT GMBH has a total of 32 patent applications. Its first patent ever was published in 2005. It filed its patents most often in Japan, EPO (European Patent Office) and United States. Its main competitors in its focus markets optics, micro-structure and nano-technology and electrical machinery and energy are ADVANCED MASK TECHNOLOGY CT GMBH & CO KG, EUV LLC and MICRO RESIST TECHNOLOGY GMBH.

Patent filings in countries

World map showing ADVANCED MASK TECHNOLOGY CT GMBHs patent filings in countries

Patent filings per year

Chart showing ADVANCED MASK TECHNOLOGY CT GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Sczyrba Martin 10
#2 Dersch Uwe 8
#3 Waiblinger Markus 8
#4 Bubke Karsten 7
#5 Feicke Axel 5
#6 Holfeld Christian 4
#7 Haffner Henning 4
#8 Chovino Christian 3
#9 Rolff Haiko 3
#10 Nesladek Pavel 3

Latest patents

Publication Filing date Title
DE102009017952A1 Lithographic mask and method of making the lithographic mask
DE102007028172B3 EUV mask and procedure for repairing an EUV mask
DE102007023034A1 Dummy blank and method for determining a blank layer
EP1857879A1 An illumination system and a photolithography apparatus
EP1857876A1 Method of forming a phase shift mask
EP1832927A1 A test pattern and a method of evaluating the transfer properties of a test pattern
EP1804034A1 A system for monitoring the position of a nozzle
EP1788445A1 A method of determining an exposure dose and exposure apparatus
EP1777587A1 A method of cleaning a surface of a photomask
EP1710623A1 Method of cleaning a substrate surface from a crystal nucleus