Process for the preparation and structuring of a photosensitive, highly viscous, chemically amplified, aqueous alkaline developable positive photoresist
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Polymer waveguide for opto-electrical circuit carriers
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Copying micro or nano-structures on optically transparent plastic surfaces, for optical purposes, imprints, nano-imprint lithography masters, or structure transfer in photoreactive system, uses curable casting resin with resist as original
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Plastic stamp for the production of micro and nanostructures with imprint lithography
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Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful in optics, optoelectronics and microelectronics, is embossed above glass transition temperature
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Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful as embossing tool for thermoplastics, is curable and embossed above glass transition temperature
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Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively
