| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Germany | 6 | |
| #2 | Taiwan | 4 | |
| #3 | Japan | 2 | |
| #4 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Micro-structure and nano-technology | |
| #3 | Electrical machinery and energy | |
| #4 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Sczyrba Martin Dr | 3 |
| #2 | Byloos Carla | 2 |
| #3 | Moukara Molela | 2 |
| #4 | Neubauer Ralf | 2 |
| #5 | Morgana Nicolo | 2 |
| #6 | Savignac Dominique | 2 |
| #7 | Sczyrba Martin | 2 |
| #8 | Noelscher Christoph | 2 |
| #9 | Foca Eugen | 2 |
| #10 | Koehle Roderick | 2 |
| Publication | Filing date | Title |
|---|---|---|
| US2014106263A1 | EUV mask set and methods of manufacturing EUV masks and integrated circuits | |
| DE102009046878A1 | Reduction of ion migration of absorber materials of lithographic masks by chromium passivation | |
| DE102008053180A1 | Particle beam writing method, particle beam writing apparatus and maintenance method for the same | |
| DE102006054820A1 | Method for correcting placement errors | |
| DE102006033450A1 | Substrate and method for producing a photomask |