QUANTISCRIPT INC has a total of 19 patent applications. Its first patent ever was published in 1998. It filed its patents most often in WIPO (World Intellectual Property Organization), Canada and United States. Its main competitors in its focus markets optics, machines and micro-structure and nano-technology are NOZAWA OSAMU, TSUBAKI HIDEAKI and EBIHARA AKIMITSU.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 5 | |
#2 | Canada | 4 | |
#3 | United States | 4 | |
#4 | Australia | 3 | |
#5 | EPO (European Patent Office) | 3 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Machines | |
#3 | Micro-structure and nano-technology | |
#4 | Semiconductors |
# | Technology | |
---|---|---|
#1 | Photomechanical semiconductor production | |
#2 | Unspecified technologies | |
#3 | Nanostructure applications | |
#4 | Semiconductor devices |
# | Name | Total Patents |
---|---|---|
#1 | Lavallee Eric | 19 |
#2 | Drouin Dominique | 18 |
#3 | Beauvais Jacques | 18 |
#4 | Awad Yousef | 5 |
#5 | Cloutier Melanie | 4 |
#6 | Mangoua Bertrand Takam | 1 |
Publication | Filing date | Title |
---|---|---|
WO2007030918A1 | High sensitivity electron beam resist processing | |
WO2005015308A2 | Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal | |
CA2381128A1 | Plasma polymerized electron beam resist | |
CA2377081A1 | Method of producing an etch-resistant polymer structure using electron beam lithography | |
CA2433076A1 | Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography | |
US6261938B1 | Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |