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Vacuum compatible, high-speed, 2-D mirror tilt stage
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Compliant layer chucking surface
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Universal EUV in-band intensity detector
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Reticle stage based linear dosimeter
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Figure correction of multilayer coated optics
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Growth of multi-component alloy films with controlled graded chemical composition on sub-nanometer scale
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Etched-multilayer phase shifting masks for EUV lithography
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Method for the manufacture of phase shifting masks for EUV lithography
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Adhesive particle shielding
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Condenser for photolithography system
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Synchrotron-based EUV lithography illuminator simulator
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Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers
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Optimized capping layers for EUV multilayers
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Radiation source with shaped emission
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