ROLITH INC has a total of 30 patent applications. Its first patent ever was published in 2008. It filed its patents most often in WIPO (World Intellectual Property Organization), China and United States. Its main competitors in its focus markets optics, machines and semiconductors are GRANIK YURI, FUKUHARA KAZUYA and ASML HOLLAND BV.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 6 | |
#2 | China | 5 | |
#3 | United States | 5 | |
#4 | Australia | 3 | |
#5 | Canada | 3 | |
#6 | EPO (European Patent Office) | 2 | |
#7 | Republic of Korea | 2 | |
#8 | Mexico | 2 | |
#9 | Japan | 1 | |
#10 | Taiwan | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Machines | |
#3 | Semiconductors | |
#4 | Micro-structure and nano-technology | |
#5 | Audio-visual technology | |
#6 | Computer technology | |
#7 | Control | |
#8 | Consumer goods |
# | Name | Total Patents |
---|---|---|
#1 | Kobrin Boris | 28 |
#2 | Volf Boris | 8 |
#3 | Landau Igor | 7 |
#4 | Mcmackin Ian | 4 |
#5 | Brongersma Mark | 3 |
#6 | Grigsby Bryant | 3 |
#7 | Aryal Mukti | 3 |
#8 | Richardson Bruce | 3 |
#9 | Barnard Edward | 3 |
#10 | Sietz Oliver | 2 |
Publication | Filing date | Title |
---|---|---|
US2015336301A1 | Cylindrical polymer mask and method of fabrication | |
WO2015183243A1 | Anti-counterfeiting features and methods of fabrication and detection | |
US9244356B1 | Transparent metal mesh and method of manufacture | |
CN104412165A | Cylindrical polymer mask and method of fabrication | |
WO2013062755A1 | Lithography with reduced feature pitch using rotating mask techniques | |
WO2013049367A2 | Plasmonic lithography using phase mask | |
AU2011293834A1 | Mask for near-field lithography and fabrication the same | |
US2011210480A1 | Nanostructures with anti-counterefeiting features and methods of fabricating the same | |
CA2786489A1 | Nanopatterning method and apparatus | |
KR20110008159A | Large area nanopatterning method and apparatus |