ADVANCED MASK TECH CENTER GMBH & CO KG has a total of 16 patent applications. Its first patent ever was published in 2006. It filed its patents most often in Germany, Republic of Korea and Taiwan. Its main competitors in its focus markets optics, measurement and micro-structure and nano-technology are GRANIK YURI, ASML NETHERLANDS BV and ASM LITHOGRAPHY BV.
# | Country | Total Patents | |
---|---|---|---|
#1 | Germany | 8 | |
#2 | Republic of Korea | 2 | |
#3 | Taiwan | 2 | |
#4 | United States | 2 | |
#5 | EPO (European Patent Office) | 1 | |
#6 | Japan | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Measurement | |
#3 | Micro-structure and nano-technology | |
#4 | Electrical machinery and energy |
# | Name | Total Patents |
---|---|---|
#1 | Bender Markus | 9 |
#2 | Schedel Thorsten | 7 |
#3 | Schenke Andreas | 4 |
#4 | Waiblinger Markus Dr | 3 |
#5 | Utzny Clemens | 2 |
#6 | Teuber Silvio Dr | 2 |
#7 | Bahrig Lydia | 2 |
#8 | Caspary Dirk | 2 |
#9 | Nesladek Pavel Dr | 1 |
#10 | Dersch Uwe Dr | 1 |
Publication | Filing date | Title |
---|---|---|
DE102019100839A1 | PHOTOMASK ARRANGEMENT WITH REFLECTIVE PHOTOMASK AND METHOD FOR PRODUCING A REFLECTIVE PHOTOMASK | |
DE102018116054A1 | Photo mask and method of making a photo mask | |
DE102015108569A1 | Reflective photo mask and reflection type mask blank | |
US2015286130A1 | Shape metrology for photomasks | |
DE102007028800A1 | Mask substrate, photomask and method of making a photomask | |
DE102007063649A1 | Method for producing structures in a resist material and electron beam exposure systems | |
DE102007006192A1 | Method and device for determining a plurality of measured values | |
DE102006050363A1 | A process for producing a photomask, a process for structuring a layer or a layer stack and resist stacks on a mask substrate |