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ADVANCED MASK TECH CENTER GMBH & CO KG

Overview
  • Total Patents
    16
  • GoodIP Patent Rank
    153,606
About

ADVANCED MASK TECH CENTER GMBH & CO KG has a total of 16 patent applications. Its first patent ever was published in 2006. It filed its patents most often in Germany, Republic of Korea and Taiwan. Its main competitors in its focus markets optics, measurement and micro-structure and nano-technology are GRANIK YURI, ASML NETHERLANDS BV and ASM LITHOGRAPHY BV.

Patent filings in countries

World map showing ADVANCED MASK TECH CENTER GMBH & CO KGs patent filings in countries

Patent filings per year

Chart showing ADVANCED MASK TECH CENTER GMBH & CO KGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Bender Markus 9
#2 Schedel Thorsten 7
#3 Schenke Andreas 4
#4 Waiblinger Markus Dr 3
#5 Utzny Clemens 2
#6 Teuber Silvio Dr 2
#7 Bahrig Lydia 2
#8 Caspary Dirk 2
#9 Nesladek Pavel Dr 1
#10 Dersch Uwe Dr 1

Latest patents

Publication Filing date Title
DE102019100839A1 PHOTOMASK ARRANGEMENT WITH REFLECTIVE PHOTOMASK AND METHOD FOR PRODUCING A REFLECTIVE PHOTOMASK
DE102018116054A1 Photo mask and method of making a photo mask
DE102015108569A1 Reflective photo mask and reflection type mask blank
US2015286130A1 Shape metrology for photomasks
DE102007028800A1 Mask substrate, photomask and method of making a photomask
DE102007063649A1 Method for producing structures in a resist material and electron beam exposure systems
DE102007006192A1 Method and device for determining a plurality of measured values
DE102006050363A1 A process for producing a photomask, a process for structuring a layer or a layer stack and resist stacks on a mask substrate