ASML NETHERLAND BV has a total of 24 patent applications. Its first patent ever was published in 2001. It filed its patents most often in China, United States and Singapore. Its main competitors in its focus markets optics, micro-structure and nano-technology and computer technology are GRANIK YURI, HEFEI CHIP FOUND MICRO ELECTRONICS EQUIPMENT CO LTD and ADVANCED MICRO OPTICS INSTR INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | China | 16 | |
#2 | United States | 7 | |
#3 | Singapore | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Micro-structure and nano-technology | |
#3 | Computer technology | |
#4 | Semiconductors | |
#5 | Control | |
#6 | Chemical engineering | |
#7 | Engines, pumps and turbines | |
#8 | Civil engineering |
# | Name | Total Patents |
---|---|---|
#1 | Loopstra Erik Roelof | 2 |
#2 | Meltens J J S M | 1 |
#3 | Steffens Koen | 1 |
#4 | Kruijt-Stegeman Yvonne Wendela | 1 |
#5 | Van Der Ham Ronald | 1 |
#6 | Van Bilsen Franciscus Bernardus Maria | 1 |
#7 | Kurt R | 1 |
#8 | Jau Jack | 1 |
#9 | Koen Steffens | 1 |
#10 | Johan Dijsseldonk Antonius Van | 1 |
Publication | Filing date | Title |
---|---|---|
US2007238037A1 | Imprint lithography | |
CN1441318A | Method for producing photoetching equipment and device |