| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 11 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Surface technology and coating | |
| #3 | Electrical machinery and energy | |
| #4 | Chemical engineering | |
| #5 | Machines | |
| #6 | Measurement |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Coating metallic material | |
| #3 | Electric discharge tubes | |
| #4 | Separation | |
| #5 | Measuring electric variables | |
| #6 | Unspecified technologies | |
| #7 | Plasma technique | |
| #8 | Unspecified technologies |
| # | Name | Total Patents |
|---|---|---|
| #1 | Masamichi Hara | 2 |
| #2 | Masato Minami | 1 |
| #3 | Hisatomi Hosaka | 1 |
| #4 | Tatsuo Hatano | 1 |
| #5 | Mochizuki Jun | 1 |
| #6 | Kohei Kawamura | 1 |
| #7 | Hiraku Ishikawa | 1 |
| #8 | Toshihisa Nozawa | 1 |
| #9 | Yoshihiro Hirota | 1 |
| #10 | Satoshi Wakabayashi | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN101632330A | Plasma processing apparatus, power supply apparatus and method for using plasma processing apparatus |