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WONIK IPS CO LTD

Overview
  • Total Patents
    816
  • GoodIP Patent Rank
    3,245
  • Filing trend
    ⇧ 39.0%
About

WONIK IPS CO LTD has a total of 816 patent applications. It increased the IP activity by 39.0%. Its first patent ever was published in 2007. It filed its patents most often in Republic of Korea, China and Taiwan. Its main competitors in its focus markets semiconductors, surface technology and coating and electrical machinery and energy are TRIKON HOLDINGS LTD, X FAB FRANCE and PROTE CO LTD.

Patent filings in countries

World map showing WONIK IPS CO LTDs patent filings in countries

Patent filings per year

Chart showing WONIK IPS CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Ryu Dong Ho 46
#2 Cho Byung Chul 43
#3 Noh Il Ho 36
#4 Kim Yong Jin 31
#5 Bang Seung Duk 30
#6 Kim Geon 29
#7 Yang Ho Sik 29
#8 Choi Young Chul 29
#9 Han Jae Byung 29
#10 Kim Young Jun 29

Latest patents

Publication Filing date Title
US2021118682A1 Processing method for substrate
CN112185844A Substrate processing apparatus
KR20210003038A Substrate supporting module and Substrate processing apparatus
KR20210003039A Substrate supporting module and Substrate processing apparatus
CN111326447A Substrate processing apparatus
KR20190140886A Apparatus of treating substrate
KR20200074854A Apparatus for processing wafer
KR20190118999A Aligning module
KR20210034862A Method of forming thin film
KR20210029931A Gas supply nozzle and substrate processing apparatus using the same
KR20210029969A Inductively coupled plasma processing apparatus
KR20210028394A Substrate processing apparatus
KR20210026560A Inductively coupled plasma processing apparatus
KR20210026270A Aligning module and substrate processing system having the same
KR20210026269A Aligning module and substrate processing system having the same
KR20210025223A Apparatus and Method for Processing of Substrate
KR20210024348A Apparatus and Method for Deposition of Thin Film
KR20210021187A Method of selectively depositing layer on at least two kinds of material layers
KR20210019850A Substrate Processing Apparatus
KR20210019851A Adaptor to supply plasma gas for semiconductor equipment and substrate processing apparatus using the same