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INTEGRATED PROCESS SYSTEMS LTD

Overview
  • Total Patents
    243
About

INTEGRATED PROCESS SYSTEMS LTD has a total of 243 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Republic of Korea, China and Taiwan. Its main competitors in its focus markets semiconductors, surface technology and coating and electrical machinery and energy are TES CO LTD, KOKUSAI ELECTRIC CORP and ASM IP HOLDING BV.

Patent filings in countries

World map showing INTEGRATED PROCESS SYSTEMS LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 220
#2 China 14
#3 Taiwan 3
#4 Japan 2
#5 United States 2
#6 Germany 1
#7 WIPO (World Intellectual Property Organization) 1

Patent filings per year

Chart showing INTEGRATED PROCESS SYSTEMS LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Seo Tae Wook 54
#2 Lee Ki Hoon 38
#3 Chang Ho Seung 29
#4 Lim Hong Joo 27
#5 Baik Choon Kum 21
#6 Park Young Hoon 17
#7 Lee Sahng Kyu 17
#8 Eom Yong Taek 17
#9 Lee Sahng Kyoo 16
#10 Cho Saeng Hyun 15

Latest patents

Publication Filing date Title
KR20100110760A Vacuum processing apparatus
KR20100088593A Vacuum processing apparatus
KR20100088592A Vacuum processing apparatus
CN101866981A Thin film deposition process module for manufacturing solar cell, thin film deposition process system for manufacturing solar cell, and cleaning method for thin film deposition process module
CN102054659A Substrate processing device and covering element thereof
KR20090086375A Reactor for depositing thin film on wafer
KR20090086374A Reactor for depositing thin film on wafer
KR20100039793A Vaccum processing apparatus
KR20100100480A Substrate processing apparatus
KR20100091476A Substrate processing apparatus and frame of same
KR20100068845A Method for depositing w thin film
KR20100066874A Apparatus for treatment of plural substrates
KR20100064802A Apparatus for treatment of plural substrates
KR20100064763A Substrate supporting apparatus and substrate processing apparatus having the same
KR20100060615A Method for depositing multiple metal system oxide thin film
KR20100056273A Apparatus for depositing thin film on wafer and method for cleaning the apparatus
KR20100056258A Method for depositing thin film on wafer
KR20100054325A Apparatus for treatment of plural substrates
KR20100051994A Apparatus for depositing tic thin film on wafer and method for cleaning the apparatus
KR20100052234A Vacuum processing apparatus and method for replacing showrhead thereof