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SUESS MICROTEC LITHOGRAPHY

Overview
  • Total Patents
    30
  • GoodIP Patent Rank
    231,109
About

SUESS MICROTEC LITHOGRAPHY has a total of 30 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Germany, EPO (European Patent Office) and Austria. Its main competitors in its focus markets optics, semiconductors and machines are BREWER SCIENCE INC, SUSS MICROTEC LITHOGRAPHY GMBH and YAMAMOTO TARO.

Patent filings per year

Chart showing SUESS MICROTEC LITHOGRAPHYs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hansen Sven 7
#2 Kaiser Paul 4
#3 Hermanowski James 3
#4 Hoeppner Juergen 2
#5 Haenel Wolfgang 2
#6 Hale Johnson 2
#7 Gorun Patrick 2
#8 Gregory George 2
#9 Stievenard Philippe 2
#10 Zoberbier Ralph 2

Latest patents

Publication Filing date Title
EP2626140A1 A method for non-drip dispensing of a liquid and a nozzle therefore
EP2253997A2 Illumination system for a microlithographic contact and proximity exposure apparatus
DE102007024122A1 Exposure configurator in Maskalignern
DE102006010732A1 Method and device for applying a structure to a substrate
DE102005057994A1 Method and device for determining the bond strength between two bonded substrates forces knife between them while determining the path and force applied
DE102004032933B3 Rotationally symmetric alignment mark centre determination procedure for semiconductor wafer mask aligners
DE102004008699B3 Process for joining at least two semiconductor substrates used in semiconductor manufacture comprises moving a radiation source relative to a bonding surface during pretreatment
DE10355681A1 Direct adjustment in Maskalignern
DE10351963A1 Process for coating semiconductor substrates
DE10320135A1 Method for positioning bump masks
DE10303902A1 Method and device for aligning an adjustment microscope using a mirrored adjustment mask
DE10256693A1 Process for pre-treating surfaces or bonding surfaces of substrates to be joined used in semiconductor technology comprises applying an atmospheric plasma before the bonding process is carried out
DE10235482B3 Device for fixing thin and flexible substrates
DE10230373B3 Triple wafer stack bonding method e.g. for mass production of micromechanical sensors, uses first clamping device for securing 2 stacked wafers prior to aligment of third wafer held by second clamping device
DE19753596A1 Device for applying a thin layer to a substrate