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SUSS MICROTEC LITHOGRAPHY GMBH

Overview
  • Total Patents
    376
  • GoodIP Patent Rank
    4,853
  • Filing trend
    ⇧ 44.0%
About

SUSS MICROTEC LITHOGRAPHY GMBH has a total of 376 patent applications. It increased the IP activity by 44.0%. Its first patent ever was published in 1998. It filed its patents most often in United States, Republic of Korea and Taiwan. Its main competitors in its focus markets semiconductors, optics and surface technology and coating are SOKUDO CO LTD, SOKUDO KK and CSMC TECH CORP.

Patent filings per year

Chart showing SUSS MICROTEC LITHOGRAPHY GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 George Gregory 60
#2 Hansen Sven 31
#3 Johnson Hale 31
#4 Bogner Bernhard 19
#5 Schindler Katrin 18
#6 Gregory George 18
#7 Fischer Katrin 16
#8 Palitschka Florian 16
#9 Hale Johnson 14
#10 Mekias Kader 14

Latest patents

Publication Filing date Title
AT522945A2 Method and test system for determining the quality of an optical projection unit
DE102019133136A1 Substrate cassette
NL2023577B1 Method for detecting alignment marks, method for aligning a first substrate relative to a second substrate as well as apparatus
WO2020228940A1 Bonding device as well as method for bonding substrates
NL2023097B1 Stamp replication device and method for producing a holding means for a stamp replication device as well as a stamp
NL2023051B1 Framework for a replication device, replication device as well as method for producing nanostructured and/or microstructured components by means of a 5 replication device
NL2023022B1 Replication device and method for reproducing a structure on a substrate
NL2022403B1 End effector for holding substrates
NL2022125B1 Apparatus for measuring a fluid flow through a pipe of a semiconductor manufacturing device
NL2021938B1 Method for measuring a thickness of a layer, method for controlling a substrate processing device as well as substrate processing device
NL2021859B1 Fixation system, support plate and method for production thereof
NL2021701B1 Edge bead removal system and method of treating a substrate
NL2021649B1 Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist
NL2021163B1 Dispensing nozzle for a Coater
AT520028A2 System and Related Techniques for Handling Aligned Wafer Pairs
DE102018112915A1 System and associated techniques for handling aligned substrate pairs
NL2021006B1 Holding apparatus and method for holding a substrate
NL2019623B1 Wafer support system, wafer support device, system comprising a wafer and a wafer support device as well as mask aligner
US2017372925A1 System and related techniques for handling aligned substrate pairs
DE102017115014A1 Light source arrangement for a photolithography exposure system and photolithography exposure system