| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 9 | |
| #2 | Japan | 5 | |
| #3 | Taiwan | 3 | |
| #4 | Republic of Korea | 2 | |
| #5 | WIPO (World Intellectual Property Organization) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Optics | |
| #3 | Electrical machinery and energy | |
| #4 | Engines, pumps and turbines |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Photomechanical semiconductor production | |
| #3 | Electric discharge tubes | |
| #4 | X-ray microscopes |
| # | Name | Total Patents |
|---|---|---|
| #1 | Shinozaki Hiroyuki | 17 |
| #2 | Tsukamoto Kiwamu | 8 |
| #3 | Kojima Yasushi | 7 |
| #4 | Yamaguchi Norihiro | 6 |
| #5 | Watanabe Katsuhide | 6 |
| #6 | Aiyoshizawa Shunichi | 6 |
| #7 | Hayashi Hiroaki | 2 |
| #8 | Kishimoto Katsumi | 2 |
| #9 | Inanami Ryoichi | 2 |
| #10 | Aiyoshizawa Shiyunichi | 1 |
| Publication | Filing date | Title |
|---|---|---|
| TW200721244A | Substrate treatment apparatus and substrate treatment method | |
| JP2007165837A | Substrate processing apparatus and substrate processing method | |
| KR20060088817A | Substrate processing apparatus and substrate processing method | |
| JP2006287181A | Substrate processing equipment and its substrate processing method | |
| JP2005005334A | Protective device of vacuum apparatus | |
| JP2004319840A | Apparatus and method for chucking wafer | |
| JP2004270653A | Evacuation device | |
| US5637878A | Process for irradiating gemstones |