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SPP TECHNOLOGIES CO LTD

Overview
  • Total Patents
    80
  • GoodIP Patent Rank
    49,384
  • Filing trend
    ⇧ 100.0%
About

SPP TECHNOLOGIES CO LTD has a total of 80 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 2007. It filed its patents most often in Japan, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, electrical machinery and energy and surface technology and coating are TEGAL CORP, SOSUL CO LTD and THINKON NEW TECH JAPAN CORPORATION.

Patent filings per year

Chart showing SPP TECHNOLOGIES CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Murakami Shoichi 27
#2 Yamamoto Takashi 20
#3 Hayami Toshihiro 18
#4 Ikemoto Naoya 18
#5 Hayashi Yasuyuki 12
#6 Oishi Akimitsu 9
#7 Hatashita Masayasu 9
#8 Tomisaka Kenichi 7
#9 Nozawa Yoshiyuki 7
#10 Sasakura Masahiro 6

Latest patents

Publication Filing date Title
JP2015198084A High-frequency power system and plasma processing apparatus comprising the same
JP2015198083A Plasma processing apparatus and plasma processing method
TW201546868A Plasma processing apparatus
KR20160091326A Silicon nitride film, production method therefor, and production device therefor
JP2015073081A Plasma etching method
WO2015151147A1 Plasma processing device
WO2015151153A1 Plasma treatment device and plasma treatment method
WO2015151151A1 Heating device and plasma treatment device provided with same
WO2015151150A1 Plasma treatment device and coil used therein
TW201537634A Plasma processing apparatus and plasma processing method
US2016118225A1 Plasma Processing Apparatus and Opening and Closing Mechanism used therein
JP2015194219A Link device
TW201537633A Heating device and plasma processing apparatus comprising the same
TW201537609A Plasma processing apparatus and coil used therein
TW201538039A High frequency power system and plasma processing apparatus provided therewith
TW201537610A Plasma processing apparatus and opening and closing mechanism used therein
JP2015183788A gear mechanism
JP2015170437A Abnormal discharge prediction method and device of plasma processing apparatus; and plasma processing apparatus with abnormal discharge prediction function
JP2015162630A Silicon carbide semiconductor element manufacturing method
JP2014099659A Plasma etching method