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ILHAHITEC

Overview
  • Total Patents
    24
  • GoodIP Patent Rank
    106,587
About

ILHAHITEC has a total of 24 patent applications. Its first patent ever was published in 2013. It filed its patents most often in Republic of Korea and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, electrical machinery and energy and surface technology and coating are SPP TECHNOLOGIES CO LTD, BEIJING NMC CO LTD and ROTH & RAU AG.

Patent filings in countries

World map showing ILHAHITECs patent filings in countries

Patent filings per year

Chart showing ILHAHITECs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Sang Myo 24
#2 Jung Min Young 20
#3 Kim Dong Soo 2

Latest patents

Publication Filing date Title
KR20210019200A Air valve leak monitoring system for semiconductor manufacturing device
KR20200040385A Gasket for shower head
KR101553664B1 Method of processing substrate using plasma and method of controlling power thereof
KR20160098538A Showerhead and substrate processing apparatus having the same
KR101629213B1 Apparatus and method of processing substrate
KR101503258B1 Method of processing subtrate using plasma
KR101514671B1 Member of processing thin film and apparatus of processing substrate having the same
KR101503257B1 Member of processing thin film and apparatus of processing substrate having the same
KR101503254B1 Apparatus and method of processing substrate
KR101503255B1 Apparatus and method of processing substrate
KR101503256B1 Apparatus and method of processing substrate
KR101439878B1 Apparatus for generating remote plasma
KR101462015B1 Member for supplying gas and apparatus for treating substrate
KR101462016B1 Apparatus for treating multistage substrate
KR101462014B1 Apparatus for treating substrate
KR101427632B1 Method of processing substrate using remote plasma
KR101383985B1 Apparatus for discharging exhaust gas
KR101340814B1 Member for supplying radio frequency power and apparatus for treating substrate
KR101346613B1 Member for supplying gas and apparatus for treating substrate
KR101286710B1 Apparatus for and method of treating substrate using inductively coupled plasma