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LAM RESERCH CORP

Overview
  • Total Patents
    159
About

LAM RESERCH CORP has a total of 159 patent applications. Its first patent ever was published in 1999. It filed its patents most often in China and Russian Federation. Its main competitors in its focus markets semiconductors, electrical machinery and energy and surface technology and coating are TEGAL CORP, SPP TECHNOLOGIES CO LTD and LAM RES CORP.

Patent filings in countries

World map showing LAM RESERCH CORPs patent filings in countries
# Country Total Patents
#1 China 158
#2 Russian Federation 1

Patent filings per year

Chart showing LAM RESERCH CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Dhindsa Rajinder 12
#2 Marakhtanov Alexei 9
#3 Redeker Fritz C 9
#4 Freer Erik M 7
#5 Yezdi Dordi 6
#6 Hudson Eric 6
#7 Venugopal Vijayakumar C 5
#8 Bailey Andrew D Iii 5
#9 De Larios John M 5
#10 Boyd John M 5

Latest patents

Publication Filing date Title
CN104272445A Installation fixture for elastomer bands and methods of using the same
CN104205307A Multiplexed heater array using ac drive for semiconductor processing
CN104025279A Peripheral rf feed and symmetric rf return with rf strap input
CN104024477A Multi-zone gas injection upper electrode system
CN104040028A Gas feed insert in a plasma processing chamber and methods therefor
CN103930596A Hybrid pulsing plasma processing systems
CN103959918A Distributed multi-zone plasma source system, method and apparatus
CN104041194A Plasma processing assemblies including hinge assemblies
CN103748260A Methods of dechucking and system thereof
CN103703870A Negative ion control for dielectric etch
CN103620729A E-beam enhanced decoupled source for semiconductor processing
CN102610477A Film bonding agent for semiconductor vacuum treatment device
CN102569013A System and method for detecting wafer stress
CN102762314A Sea landing of space launch vehicles and associated systems and methods
CN102473660A Automatic fault detection and classification in a plasma processing system and methods thereof
CN102227804A Method and system for centering wafer on chuck
CN102187437A Silicon etch with passivation using chemical vapor deposition
CN102203930A Tactile wafer lifter and methods for operating the same
CN102160161A Adjustable thermal contact between an electrostatic chuck and a hot edge ring by clocking a coupling ring
CN102089868A Improvement of organic line width roughness with H2 plasma treatment