HONDA MASANOBU has a total of 22 patent applications. Its first patent ever was published in 2006. It filed its patents most often in United States. Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are SOSUL CO LTD, IBIS TECHNOLOGY CORP and TEL EPION INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 22 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Semiconductors | |
#3 | Surface technology and coating | |
#4 | Chemical engineering | |
#5 | Machines |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Semiconductor devices | |
#3 | Coating metallic material | |
#4 | Unspecified technologies | |
#5 | Metallic material removal | |
#6 | Cleaning |
# | Name | Total Patents |
---|---|---|
#1 | Honda Masanobu | 22 |
#2 | Matsui Yutaka | 5 |
#3 | Sato Manabu | 4 |
#4 | Nakayama Hiroyuki | 2 |
#5 | Ichikawa Hironobu | 2 |
#6 | Matsuyama Shoichiro | 2 |
#7 | Matsumoto Naoki | 2 |
#8 | Iwata Manabu | 2 |
#9 | Nagaseki Kazuya | 1 |
#10 | Hayami Toshihiro | 1 |
Publication | Filing date | Title |
---|---|---|
US2009275207A1 | Plasma processing method and computer readable storage medium | |
US2007234960A1 | Plasma processing apparatus | |
US2007224817A1 | Plasma processing apparatus, plasma processing method, and storage medium | |
US2007186952A1 | Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber | |
US2006273733A1 | Plasma processing chamber, potential controlling apparatus, potential controlling method, program for implementing the method, and storage medium storing the program | |
US2006196847A1 | Plasma processing method and apparatus |