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SPP TECH CO LTD

Overview
  • Total Patents
    87
  • GoodIP Patent Rank
    19,228
  • Filing trend
    ⇩ 23.0%
About

SPP TECH CO LTD has a total of 87 patent applications. It decreased the IP activity by 23.0%. Its first patent ever was published in 2006. It filed its patents most often in Japan, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets electrical machinery and energy, semiconductors and chemical engineering are ADVANCED MICRO-FABRICATION EQUIPMENT INC, SOSUL CO LTD and GODET LUDOVIC.

Patent filings per year

Chart showing SPP TECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Murakami Shoichi 16
#2 Yamamoto Takashi 14
#3 Hayami Toshihiro 14
#4 Hayashi Yasuyuki 12
#5 Ikemoto Naoya 8
#6 Ota Kazuya 7
#7 Fujii Ryosuke 7
#8 Fujiwara Yuki 7
#9 Nozawa Yoshiyuki 6
#10 Oishi Akimitsu 5

Latest patents

Publication Filing date Title
WO2020166295A1 Method for detecting abnormal lifting and lowering of substrate
WO2020194778A1 Assistance system, assistance method, and program
JP2020031049A Plasma processing apparatus
WO2020225920A1 Plasma ignition method and plasma generation device
JP2019143811A Gear mechanism
WO2020194413A1 Maintenance assistance system, maintenance assistance method, and program
WO2020178945A1 Process determination device for substrate processing device, substrate processing system, process determination method for substrate processing device, and group of learning models
WO2020144823A1 Etching end-point detecting device, substrate processing system, etching end-point detecting method, and classifier
JP2020106135A Processing device, attachment/detachment mechanism and link mechanism
EP3640973A1 Wide-gap semiconductor substrate, apparatus for manufacturing wide-gap semiconductor substrate, and method for manufacturing wide-gap semiconductor substrate
JP2019054282A Method for etching silicon germanium layer
JP2019169699A Focus ring and plasma processing apparatus including the same
JP2020065018A Method of detaching substrate in plasma processing apparatus
JP2018207129A Substrate transport apparatus, and substrate transport method using the same
JP2018137483A Plasma processing method and substrate produced using this method
JP2019175709A Substrate processing apparatus
JP2019140314A Method for manufacturing silicon nitride film and manufacturing device
JP2019140211A Substrate mounting table and plasma processing apparatus and plasma processing method including the same
JP2019056481A Fastening structure, plasma processing device including the same, and nut for fastening structure
JP2019036614A Plasma processing apparatus