HORSKY THOMAS N has a total of 16 patent applications. Its first patent ever was published in 2003. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are FRANZ ROTHER, DIAMOND SEMICONDUCTOR GROUP and JIANGSU LEUVEN INSTR CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 12 | |
#2 | WIPO (World Intellectual Property Organization) | 4 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Semiconductors | |
#3 | Surface technology and coating | |
#4 | Machines | |
#5 | Chemical engineering |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Semiconductor devices | |
#3 | Coating metallic material | |
#4 | Unspecified technologies | |
#5 | Cleaning |
# | Name | Total Patents |
---|---|---|
#1 | Horsky Thomas N | 16 |
#2 | Jacobson Dale C | 9 |
#3 | Krull Wade A | 4 |
#4 | Milgate Robert W Iii | 3 |
#5 | Sacco George P Jr | 2 |
#6 | Manning Dennis | 2 |
#7 | Dyker Erin | 1 |
#8 | Cook Kevin S | 1 |
#9 | Williams John N | 1 |
#10 | Adams Douglas R | 1 |
Publication | Filing date | Title |
---|---|---|
US2009283695A1 | Multi mode ion source | |
US2008223409A1 | Method and apparatus for extending equipment uptime in ion implantation | |
WO2008128039A2 | Cluster ion implantation for defect engineering | |
US2008122005A1 | Ion implantation with molecular ions containing phosphorus and arsenic | |
US2007278417A1 | Ion implantation ion source, system and method | |
US2008305598A1 | Ion implantation device and a method of semiconductor manufacturing by the implantation of ions derived from carborane molecular species | |
US2008073559A1 | Controlling the flow of vapors sublimated from solids |