|
CN111211029A
|
|
Multi-zone temperature control plasma reactor
|
|
TW201642304A
|
|
Inductively coupled plasma processing system and processing method
|
|
CN107154332A
|
|
A kind of plasma processing apparatus and method
|
|
CN107146753A
|
|
A kind of plasma processing apparatus
|
|
CN107134400A
|
|
A kind of control method, RF power divider and ICP equipment
|
|
CN107134401A
|
|
A kind of control method, RF power divider and ICP equipment
|
|
CN107134625A
|
|
A kind of control method, RF power divider and ICP equipment
|
|
CN106935470A
|
|
A kind of plasma processor with temperature measuring equipment
|
|
CN106935469A
|
|
A kind of plasma processor for realizing external magnetic field shielding
|
|
CN106930631A
|
|
A kind of hinge and its vacuum treatment installation opened and closed for vacuum chamber lid
|
|
CN106937474A
|
|
A kind of inductively coupled plasma processor
|
|
CN106935467A
|
|
A kind of inductively coupled plasma processor
|
|
CN106939746A
|
|
The headstock gear and vacuum chamber for avoiding vacuum chamber chamber door from overshooting
|
|
CN106935494A
|
|
A kind of method that Bosch technique etches silicon chip
|
|
CN106937475A
|
|
Plasma processing apparatus
|
|
CN106935530A
|
|
A kind of plasma etching photoetching adhesive dispenser
|
|
CN106926246A
|
|
A kind of mechanical arm used in vacuum environment
|
|
CN106935468A
|
|
A kind of semiconductor processor and the multi-region temp controlling heater for semiconductor processor
|
|
CN106935529A
|
|
A kind of substrate support platform and its manufacture method
|
|
CN106937473A
|
|
A kind of inductively coupled plasma processor
|
