|
CN111081525A
|
|
Device for blocking plasma backflow protection air inlet structure of process chamber
|
|
CN111081524A
|
|
Rotatable Faraday cleaning device and plasma processing system
|
|
CN110849281A
|
|
Aperture gauge capable of realizing automatic closed-loop control of optical system and measurement method
|
|
CN110643970A
|
|
Method for plating high-adhesion film on III-V material
|
|
CN110684966A
|
|
Method for growing compact film in PECVD mode
|
|
CN110610895A
|
|
Spring thimble mechanism for platform and vacuum plasma processing cavity
|
|
CN110649152A
|
|
Etching method of niobium-based superconducting device
|
|
CN110635022A
|
|
Niobium-based Josephson junction etching method
|
|
WO2020098371A1
|
|
Reaction cavity lining
|
|
CN110571120A
|
|
Ion source etching chamber with cleaning equipment and ion beam cleaning method
|
|
CN110571121A
|
|
Ion beam etching device and method for self-cleaning by adopting remote plasma
|
|
CN110571122A
|
|
IBE etching machine adopting double ion sources and etching method
|
|
CN110571115A
|
|
ion beam etching machine with movable multi-ion source configuration
|
|
CN110429016A
|
|
A kind of ion bean etcher with rotation electrode driving
|
|
CN110544615A
|
|
Plasma etching system
|
|
CN110491760A
|
|
A kind of faraday's cleaning device and plasma process system
|
|
CN110491759A
|
|
A kind of plasma etching system
|
|
CN110491758A
|
|
A kind of the ion beam etching chamber and processing method of assembly cleaning liner
|
|
CN110415948A
|
|
A kind of three-dimensional four spiral inductances coupling coil
|
|
CN110257798A
|
|
A kind of ICP-CVD prepares the deposition method of amorphous carbon film
|
