KR102148350B1
|
|
A Plasma Source Coil Capable of Changing a Structure and a Method for Controlling the Same
|
KR102113088B1
|
|
A Plasma Source Coil Assembly and a Method for Heating with the Same
|
KR102041518B1
|
|
A Separate Plasma Source Coil and a Method for Controlling the Same
|
KR102090278B1
|
|
An Exchanging Apparatus for Exchanging a Semiconductor Element and a Method for Exchanging with the Same
|
KR20190046440A
|
|
Semiconductor apparatus including dual gate valve
|
KR20190046439A
|
|
Wafer chuck including heater pattern and method of fabricating the same
|
KR101839578B1
|
|
Apparatus for manufacturing a semiconductor having a plurality of gas supplying channels
|
KR20180069991A
|
|
Separable wafer susceptor and semiconductor process chamber apparatus including the same
|
KR20160100281A
|
|
Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
|
KR20160099074A
|
|
Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
|
KR20160099073A
|
|
Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
|
KR101776848B1
|
|
Atomic layer etching apparatus and atomic layer etching process using the apparatus
|
KR20170113838A
|
|
Apparatus for manufacturing a semiconductor device having the function of detecting the warpage of the semiconductor wafer
|
KR20170093313A
|
|
Apparatus for processing semiconductor wafer and method of processing semiconductor wafer using the apparatus
|
KR20170093314A
|
|
Apparatus for manufacturing a semiconductor device and method of processing a semiconductor wafer using the same
|
KR20160145881A
|
|
An apparatus for manufacturing a semiconductor having a liftpin and a method of assembling the same
|
KR101614410B1
|
|
Method of etching for high selectivity and method of fabricating a pattern using the same
|
KR20160095303A
|
|
Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
|
KR101585945B1
|
|
Apparatus of etching a semiconductor device using plasma and method of etching the semiconductor device using the same
|
KR20150081723A
|
|
Apparatus for manufacturing semiconductor device and method of fabricating the semiconductor device using the same
|