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ADAPTIVE PLASMA TECH CORP

Overview
  • Total Patents
    120
  • GoodIP Patent Rank
    75,362
  • Filing trend
    ⇩ 100.0%
About

ADAPTIVE PLASMA TECH CORP has a total of 120 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2002. It filed its patents most often in Republic of Korea, China and EPO (European Patent Office). Its main competitors in its focus markets electrical machinery and energy, semiconductors and chemical engineering are NIHON SHINKOSHINGI CO LTD, THINKON NEW TECH JAPAN CORPORATION and SPP TECH CO LTD.

Patent filings per year

Chart showing ADAPTIVE PLASMA TECH CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kim Nam Hun 43
#2 Kim Nam-Hun 20
#3 Jang Hwi Gon 14
#4 Oh Sang Ryong 11
#5 Kim Nam Heon 11
#6 Lee Sang Woo 10
#7 Park Kwan Tae 7
#8 Song Yeong Su 7
#9 Oh Sang Young 6
#10 Oh Young Kun 6

Latest patents

Publication Filing date Title
KR102148350B1 A Plasma Source Coil Capable of Changing a Structure and a Method for Controlling the Same
KR102113088B1 A Plasma Source Coil Assembly and a Method for Heating with the Same
KR102041518B1 A Separate Plasma Source Coil and a Method for Controlling the Same
KR102090278B1 An Exchanging Apparatus for Exchanging a Semiconductor Element and a Method for Exchanging with the Same
KR20190046440A Semiconductor apparatus including dual gate valve
KR20190046439A Wafer chuck including heater pattern and method of fabricating the same
KR101839578B1 Apparatus for manufacturing a semiconductor having a plurality of gas supplying channels
KR20180069991A Separable wafer susceptor and semiconductor process chamber apparatus including the same
KR20160100281A Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
KR20160099074A Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
KR20160099073A Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
KR101776848B1 Atomic layer etching apparatus and atomic layer etching process using the apparatus
KR20170113838A Apparatus for manufacturing a semiconductor device having the function of detecting the warpage of the semiconductor wafer
KR20170093313A Apparatus for processing semiconductor wafer and method of processing semiconductor wafer using the apparatus
KR20170093314A Apparatus for manufacturing a semiconductor device and method of processing a semiconductor wafer using the same
KR20160145881A An apparatus for manufacturing a semiconductor having a liftpin and a method of assembling the same
KR101614410B1 Method of etching for high selectivity and method of fabricating a pattern using the same
KR20160095303A Adaptively plasma source having improved CD uniformity, and plasma chamber using the same
KR101585945B1 Apparatus of etching a semiconductor device using plasma and method of etching the semiconductor device using the same
KR20150081723A Apparatus for manufacturing semiconductor device and method of fabricating the semiconductor device using the same