|
CN112103222A
|
|
Megasonic wave-assisted film deposition equipment and method for filling deep hole with high depth-to-width ratio
|
|
CN111926306A
|
|
Deposition equipment based on multi-process-cavity transmission and wafer deposition method
|
|
CN111705302A
|
|
Vapor deposition equipment capable of realizing stable lifting of wafer
|
|
CN111740004A
|
|
Aluminum nitride-based film structure, semiconductor device and preparation method thereof
|
|
CN111734799A
|
|
Rotary device capable of removing radial force, heater rotary system and semiconductor equipment
|
|
CN111524841A
|
|
Semiconductor process equipment and method capable of detecting mechanical microparticles in real time
|
|
CN111455341A
|
|
Physical vapor deposition equipment based on magnetic coupling rotation
|
|
CN111424260A
|
|
Chemical vapor deposition equipment with efficient cleaning capability and semiconductor process method
|
|
CN111364026A
|
|
Reciprocating rotary CVD equipment and application method
|
|
CN111235547A
|
|
Chemical vapor deposition method
|
|
CN111554590A
|
|
Semiconductor hole filling vacuum system and hole filling method
|
|
CN111155068A
|
|
Physical vapor deposition pore filling equipment
|
|
CN111254383A
|
|
Physical vapor deposition equipment for improving uniformity of reactive sputtering film
|
|
CN111041434A
|
|
Physical vapor deposition apparatus for depositing insulating film
|
|
CN110923644A
|
|
Physical vapor deposition apparatus for reactive sputtering
|
|
CN110819961A
|
|
Physical vapor deposition equipment for improving film uniformity
|
|
CN111107324A
|
|
Monitoring device and monitoring method of wafer transmission system
|
|
CN110670042A
|
|
Physical vapor deposition apparatus for thick film deposition
|
|
CN110527967A
|
|
Pvd equipment
|
|
CN111564354A
|
|
Method and apparatus for wafer plasma etching
|
