KOBUS SAS has a total of 37 patent applications. It decreased the IP activity by 40.0%. Its first patent ever was published in 2014. It filed its patents most often in EPO (European Patent Office), WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and semiconductors are DICKEY ERIC R, DIAROTECH and TORREX EQUIPMENT CORP.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 8 | |
#2 | WIPO (World Intellectual Property Organization) | 7 | |
#3 | China | 6 | |
#4 | United States | 6 | |
#5 | Republic of Korea | 5 | |
#6 | France | 3 | |
#7 | Taiwan | 2 |
# | Technology | |
---|---|---|
#1 | Coating metallic material | |
#2 | Electric discharge tubes | |
#3 | Semiconductor devices | |
#4 | Acyclic or carbocyclic compounds | |
#5 | Metallic material cleaning | |
#6 | Soaps | |
#7 | Metallic material removal |
# | Name | Total Patents |
---|---|---|
#1 | Vitiello Julien | 26 |
#2 | Piallat Fabien | 23 |
#3 | Nal Patrice | 15 |
#4 | Borean Christophe | 14 |
#5 | Delcarri Jean-Luc | 3 |
Publication | Filing date | Title |
---|---|---|
EP3676414A1 | Method for depositing an insulating material into a via | |
CN109844173A | For delivering gas to the device in CVD reactor | |
WO2018065321A1 | Method for injecting chemical species in the gas phase in plasma-pulsed form | |
FR3064283A1 | METHOD AND REACTOR DEVICE FOR MAKING THIN LAYERS USING SUCCESSION OF STAGES OF DEPOSITS, AND APPLICATIONS THEREOF | |
FR3061914A1 | TREATMENT CHAMBER FOR A CHEMICAL VAPOR DEPOSITION REACTOR (CVD) AND METHOD OF THERMALIZATION IMPLEMENTED IN THIS CHAMBER | |
CN108603288A | The method for producing aluminium oxide and/or aluminium nitride |