AIXTRON INC

Overview

Total Patents

20
GoodIP Patent Rank

193,207

About

AIXTRON INC has a total of 20 patent applications. Its first patent ever was published in 1998. It filed its patents most often in United States, Republic of Korea and Taiwan. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are FUSIONAID CO LTD, ANGSTRON SYSTEMS INC and SHANGHAI BETONE SEMICONDUCTOR ENERGY TECH CO LTD.

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Patent filings in countries

World map showing AIXTRON INCs patent filings in countries

#	Country	Total Patents
#1	United States	13
#2	Republic of Korea	2
#3	Taiwan	2
#4	EPO (European Patent Office)	1
#5	Japan	1
#6	WIPO (World Intellectual Property Organization)	1

Patent filings per year

Chart showing AIXTRON INCs patent filings per year from 1900 to 2020

Similar Companies

FUSIONAID CO LTD 99% similarity

ANGSTRON SYSTEMS INC 99% similarity

SHANGHAI BETONE SEMICONDUCTOR ENERGY TECH CO LTD 99% similarity

SYNOS TECHNOLOGY INC 99% similarity

DICKEY ERIC R 99% similarity

INTEGRATED PROCESS SYSTEMS 99% similarity

KOBUS SAS 99% similarity

DIAROTECH 99% similarity

SOLMATES BV 98% similarity

VTS CORP 98% similarity

Focus industries

#	Industry
#1	Surface technology and coating
#2	Semiconductors
#3	Electrical machinery and energy
#4	Machines
#5	Optics
#6	Environmental technology

Focus technologies

#	Technology
#1	Coating metallic material
#2	Semiconductor devices
#3	Single-crystal-growth
#4	Electric discharge tubes
#5	Unspecified technologies
#6	Devices for applying fluent materials
#7	Optical systems
#8	Processes for applying fluent materials
#9	Reduction of greenhouse gas emissions

Top inventors

#	Name	Total Patents
#1	Seidel Thomas E	6
#2	Galewski Carl	5
#3	Joh Sooyun	4
#4	Karim M Ziaul	4
#5	Dalton Jeremie J	4
#6	Savas Stephen E	4
#7	Mantripragada Sai	4
#8	Doering Kenneth	3
#9	Strauch Gerhard K	3
#10	Londergan Ana R	3

Latest patents

Publication	Filing date	Title
US2016289837A1	2016-06-01	Apparatus and method for forming thin protective and optical layers on substrates
US2014314965A1	2014-07-01	Apparatus and method for dielectric deposition
US2013334511A1	2013-06-13	Method for deposition of high-performance coatings and encapsulated electronic devices
WO2008011579A2	2007-07-20	Small volume symmetric flow single wafer ald apparatus
KR20070100120A	2007-03-30	Method and apparatus for providing uniform gas delivery to a reactor
KR20080075179A	2006-11-22	Small volume symmetric flow single wafer ald apparatus